Geant4 Cross Reference |
1 // 2 // ******************************************************************** 3 // * License and Disclaimer * 4 // * * 5 // * The Geant4 software is copyright of the Copyright Holders of * 6 // * the Geant4 Collaboration. It is provided under the terms and * 7 // * conditions of the Geant4 Software License, included in the file * 8 // * LICENSE and available at http://cern.ch/geant4/license . These * 9 // * include a list of copyright holders. * 10 // * * 11 // * Neither the authors of this software system, nor their employing * 12 // * institutes,nor the agencies providing financial support for this * 13 // * work make any representation or warranty, express or implied, * 14 // * regarding this software system or assume any liability for its * 15 // * use. Please see the license in the file LICENSE and URL above * 16 // * for the full disclaimer and the limitation of liability. * 17 // * * 18 // * This code implementation is the result of the scientific and * 19 // * technical work of the GEANT4 collaboration. * 20 // * By using, copying, modifying or distributing the software (or * 21 // * any work based on the software) you agree to acknowledge its * 22 // * use in resulting scientific publications, and indicate your * 23 // * acceptance of all terms of the Geant4 Software license. * 24 // ******************************************************************** 25 // 26 // 27 // G4MicroElecLOPhononScattering.cc, 28 // 2020/05/20 P. Caron, C. Inguimbert are with ONERA [b] 29 // Q. Gibaru is with CEA [a], ONERA [b] and CNES [c] 30 // M. Raine and D. Lambert are with CEA [a] 31 // 32 // A part of this work has been funded by the French space agency(CNES[c]) 33 // [a] CEA, DAM, DIF - 91297 ARPAJON, France 34 // [b] ONERA - DPHY, 2 avenue E.Belin, 31055 Toulouse, France 35 // [c] CNES, 18 av.E.Belin, 31401 Toulouse CEDEX, France 36 // 37 // Based on the following publications 38 // 39 // - J. Pierron, C. Inguimbert, M. Belhaj, T. Gineste, J. Puech, M. Raine 40 // Electron emission yield for low energy electrons: 41 // Monte Carlo simulation and experimental comparison for Al, Ag, and Si 42 // Journal of Applied Physics 121 (2017) 215107. 43 // https://doi.org/10.1063/1.4984761 44 // 45 // - P. Caron, 46 // Study of Electron-Induced Single-Event Upset in Integrated Memory Devices 47 // PHD, 16th October 2019 48 // 49 // - Q.Gibaru, C.Inguimbert, P.Caron, M.Raine, D.Lambert, J.Puech, 50 // Geant4 physics processes for microdosimetry and secondary electron emission simulation : 51 // Extension of MicroElec to very low energies and new materials 52 // NIM B, 2020, in review. 53 // 54 // 55 //....oooOO0OOooo........oooOO0OOooo........oooOO0OOooo........oooOO0OOooo...... 56 57 #include "G4MicroElecLOPhononScattering.hh" 58 #include "G4DummyModel.hh" 59 #include "G4SystemOfUnits.hh" 60 #include "G4LowEnergyEmProcessSubType.hh" 61 62 //....oooOO0OOooo........oooOO0OOooo........oooOO0OOooo........oooOO0OOooo...... 63 64 using namespace std; 65 66 G4MicroElecLOPhononScattering::G4MicroElecLOPhononScattering( 67 const G4String& processName, G4ProcessType type) 68 :G4VEmProcess(processName, type), 69 isInitialised(false) 70 { 71 SetProcessSubType(fLowEnergyElastic); 72 } 73 74 //....oooOO0OOooo........oooOO0OOooo........oooOO0OOooo........oooOO0OOooo...... 75 76 G4MicroElecLOPhononScattering::~G4MicroElecLOPhononScattering() 77 {} 78 79 //....oooOO0OOooo........oooOO0OOooo........oooOO0OOooo........oooOO0OOooo.... 80 81 G4bool G4MicroElecLOPhononScattering::IsApplicable(const G4ParticleDefinition& p) 82 { 83 return (&p == G4Electron::Electron()); 84 } 85 86 //....oooOO0OOooo........oooOO0OOooo........oooOO0OOooo........oooOO0OOooo.... 87 88 void G4MicroElecLOPhononScattering::InitialiseProcess(const G4ParticleDefinition*) 89 { 90 if (!isInitialised) 91 { 92 isInitialised = true; 93 SetBuildTableFlag(false); 94 if (!EmModel(0)) SetEmModel(new G4DummyModel()); 95 AddEmModel(2, EmModel(0)); 96 } 97 } 98 99 //....oooOO0OOooo........oooOO0OOooo........oooOO0OOooo........oooOO0OOooo...... 100