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1 // 2 // ******************************************************************** 3 // * License and Disclaimer * 4 // * * 5 // * The Geant4 software is copyright of the Copyright Holders of * 6 // * the Geant4 Collaboration. It is provided under the terms and * 7 // * conditions of the Geant4 Software License, included in the file * 8 // * LICENSE and available at http://cern.ch/geant4/license . These * 9 // * include a list of copyright holders. * 10 // * * 11 // * Neither the authors of this software system, nor their employing * 12 // * institutes,nor the agencies providing financial support for this * 13 // * work make any representation or warranty, express or implied, * 14 // * regarding this software system or assume any liability for its * 15 // * use. Please see the license in the file LICENSE and URL above * 16 // * for the full disclaimer and the limitation of liability. * 17 // * * 18 // * This code implementation is the result of the scientific and * 19 // * technical work of the GEANT4 collaboration. * 20 // * By using, copying, modifying or distributing the software (or * 21 // * any work based on the software) you agree to acknowledge its * 22 // * use in resulting scientific publications, and indicate your * 23 // * acceptance of all terms of the Geant4 Software license. * 24 // ******************************************************************** 25 // 26 // 27 // G4MicroElecLOPhononModel.hh, 28 // 2020/05/20 P. Caron, C. Inguimbert are with ONERA [b] 29 // Q. Gibaru is with CEA [a], ONERA [b] and CNES [c] 30 // M. Raine and D. Lambert are with CEA [a] 31 // 32 // A part of this work has been funded by the French space agency(CNES[c]) 33 // [a] CEA, DAM, DIF - 91297 ARPAJON, France 34 // [b] ONERA - DPHY, 2 avenue E.Belin, 31055 Toulouse, France 35 // [c] CNES, 18 av.E.Belin, 31401 Toulouse CEDEX, France 36 // 37 // Based on the following publications 38 // 39 // - Q.Gibaru, C.Inguimbert, P.Caron, M.Raine, D.Lambert, J.Puech, 40 // Geant4 physics processes for microdosimetry and secondary electron emission simulation : 41 // Extension of MicroElec to very low energies and new materials 42 // NIM B, 2020, in review. 43 // 44 // 45 //....oooOO0OOooo........oooOO0OOooo........oooOO0OOooo........oooOO0OOooo...... 46 47 #ifndef G4MICROELECLOPHONONSCATTERING_HH 48 #define G4MICROELECLOPHONONSCATTERING_HH 1 49 50 #include "G4VEmProcess.hh" 51 #include "G4Electron.hh" 52 #include "G4MicroElecLOPhononModel.hh" 53 54 //....oooOO0OOooo........oooOO0OOooo........oooOO0OOooo........oooOO0OOooo...... 55 56 class G4MicroElecLOPhononScattering : public G4VEmProcess 57 { 58 public: 59 explicit G4MicroElecLOPhononScattering(const G4String& processName = "LOPhononScattering", 60 G4ProcessType type = fElectromagnetic); 61 ~G4MicroElecLOPhononScattering() override; 62 63 G4bool IsApplicable(const G4ParticleDefinition&) override; 64 65 protected: 66 void InitialiseProcess(const G4ParticleDefinition*) override; 67 68 private: 69 G4bool isInitialised; 70 }; 71 72 //....oooOO0OOooo........oooOO0OOooo........oooOO0OOooo........oooOO0OOooo...... 73 74 #endif 75