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Geant4/examples/advanced/microelectronics/README

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Diff markup

Differences between /examples/advanced/microelectronics/README (Version 11.3.0) and /examples/advanced/microelectronics/README (Version 11.2.2)


  1 ----------------------------------------------      1 -------------------------------------------------------------------
  2 ----------------------------------------------      2 -------------------------------------------------------------------
  3                                                     3 
  4      =========================================      4      =========================================================
  5       Geant4 - Microelectronics example             5       Geant4 - Microelectronics example
  6      =========================================      6      =========================================================
  7                                                     7 
  8                                 README file         8                                 README file
  9                           --------------------      9                           ----------------------
 10                                                    10 
 11                            CORRESPONDING AUTHO     11                            CORRESPONDING AUTHORS 
 12                                                    12 
 13 M. Raine*, D. Lambert*, C. Inguimbert', Q. Gib     13 M. Raine*, D. Lambert*, C. Inguimbert', Q. Gibaru' 
 14 * CEA, DAM, DIF, F-91297 Arpajon, France           14 * CEA, DAM, DIF, F-91297 Arpajon, France
 15 ' ONERA, 2 avenue Edouard Belin - BP 74025 - 3     15 ' ONERA, 2 avenue Edouard Belin - BP 74025 - 31055 TOULOUSE, France
 16 email: melanie.raine@cea.fr  damien.lambert@ce     16 email: melanie.raine@cea.fr  damien.lambert@cea.fr
 17        christophe.Inguimbert@onera.fr Quentin.     17        christophe.Inguimbert@onera.fr Quentin.Gibaru@onera.fr
 18                                                    18 
 19 ---->0. INTRODUCTION.                              19 ---->0. INTRODUCTION.                                                    
 20                                                    20                                                                        
 21 The microelectronics example simulates the tra     21 The microelectronics example simulates the track of a 5 MeV proton in silicon. 
 22 Geant4 standard EM models are used in the Worl     22 Geant4 standard EM models are used in the World volume while Geant4-MicroElec models
 23 are used in a Target volume, declared as a Reg     23 are used in a Target volume, declared as a Region.
 24                                                    24 
 25 ---->1. GEOMETRY SET-UP.                           25 ---->1. GEOMETRY SET-UP.
 26                                                    26  
 27 By default, the geometry is a 2 um side cube (     27 By default, the geometry is a 2 um side cube (World) made of silicon containing 
 28 a smaller cubic Target volume of silicon (1 um     28 a smaller cubic Target volume of silicon (1 um3). 
 29 The target material can be modified and simula     29 The target material can be modified and simulated with G4MicroElecPhysics processes.
 30                                                    30 
 31 ---->2. SET-UP                                     31 ---->2. SET-UP 
 32                                                    32                                                                         
 33 Make sure that the G4EMLOW database version is     33 Make sure that the G4EMLOW database version is correct (> or = 7.16)
 34                                                    34 
 35 The variable G4ANALYSIS_USE must be set to 1.      35 The variable G4ANALYSIS_USE must be set to 1.
 36                                                    36   
 37 The code should be compiled with cmake:            37 The code should be compiled with cmake: 
 38     $ mkdir microelectronics-build                 38     $ mkdir microelectronics-build
 39     $ cd microelectronics-build                    39     $ cd microelectronics-build
 40     $ cmake -DGeant4_DIR=/your_path/geant4-ins     40     $ cmake -DGeant4_DIR=/your_path/geant4-install/ $PATHTOMICROELECEXAMPLE/microelectronics
 41     $ make                                         41     $ make
 42                                                    42 
 43 It works in MT mode (but in this example today     43 It works in MT mode (but in this example today MT=1 due to memory consumption of new Microelec models).
 44                                                    44 
 45 ---->3. HOW TO RUN THE EXAMPLE                     45 ---->3. HOW TO RUN THE EXAMPLE                                         
 46                                                    46 
 47 In interactive mode, run:                          47 In interactive mode, run:
 48                                                    48 
 49 ./microelectronics                                 49 ./microelectronics
 50                                                    50 
 51 The macro microelectronics.mac is executed by      51 The macro microelectronics.mac is executed by default. 
 52                                                    52 
 53 To get visualization, make sure to uncomment t     53 To get visualization, make sure to uncomment the #/control/execute vis.mac
 54  line in the macro.                                54  line in the macro.
 55                                                    55 
 56  By default, the new MicroElec models are used     56  By default, the new MicroElec models are used. 
 57  You can used the Silicon MicroElec models, wi     57  You can used the Silicon MicroElec models, with the "-onlySi" option:
 58  ./microelectronics -onlySi                        58  ./microelectronics -onlySi
 59 or                                                 59 or
 60 ./microelectronics microelectronics.mac -onlyS     60 ./microelectronics microelectronics.mac -onlySi
 61                                                    61 
 62 You can change the type of the target material     62 You can change the type of the target material 
 63 (G4_Ag G4_Al G4_C G4_Cu G4_Ge G4_KAPTON G4_Ni      63 (G4_Ag G4_Al G4_C G4_Cu G4_Ge G4_KAPTON G4_Ni G4_Si G4_SILICON_DIOXIDE G4_Ti G4_W), 
 64 if you uncomment one line (/microelectronics/d     64 if you uncomment one line (/microelectronics/det/setMat) into the .mac file. 
 65                                                    65 
 66                                                    66 
 67                                                    67 
 68 ---->4. PHYSICS                                    68 ---->4. PHYSICS
 69                                                    69 
 70 This example shows:                                70 This example shows:
 71 - how to use the G4MicroElecPhysics and G4Micr     71 - how to use the G4MicroElecPhysics and G4MicroElecSiPhysics processes, 
 72 - how to affect them a name                        72 - how to affect them a name
 73 - how to combine them with Standard EM Physics     73 - how to combine them with Standard EM Physics.
 74                                                    74 
 75 A simple electron capture process is also prov     75 A simple electron capture process is also provided in order to kill electrons 
 76 below a chosen energy threshold, set in the Ph     76 below a chosen energy threshold, set in the Physics list.
 77                                                    77 
 78 Look at the G4MicroElecSiPhysics.cc (previous      78 Look at the G4MicroElecSiPhysics.cc (previous silicon MicroElec models)
 79 and G4MicroElecPhysics.cc (new MicroElec model     79 and G4MicroElecPhysics.cc (new MicroElec models) files.
 80                                                    80 
 81 ---->5. SIMULATION OUTPUT AND RESULT ANALYZIS      81 ---->5. SIMULATION OUTPUT AND RESULT ANALYZIS                                    
 82                                                    82 
 83 The output results consists in a microelectron     83 The output results consists in a microelectronics.root file, containing for each simulation step:
 84 - the type of particle for the current step        84 - the type of particle for the current step
 85 - the type of process for the current step         85 - the type of process for the current step
 86 - the track position of the current step (in n     86 - the track position of the current step (in nanometers)
 87 - the energy deposit along the current step (i     87 - the energy deposit along the current step (in eV)
 88 - the step length (in nm)                          88 - the step length (in nm)
 89 - the total enery loss along the current step      89 - the total enery loss along the current step (in eV)
 90                                                    90 
 91 This file can be easily analyzed using for exa     91 This file can be easily analyzed using for example the provided ROOT macro 
 92 file plot.C; to do so :                            92 file plot.C; to do so :
 93 * be sure to have ROOT installed on your machi     93 * be sure to have ROOT installed on your machine
 94 * be sure to be in the microelectronics direct     94 * be sure to be in the microelectronics directory
 95 * launch ROOT by typing root                       95 * launch ROOT by typing root
 96 * under your ROOT session, type in : .X plot.C     96 * under your ROOT session, type in : .X plot.C to execute the macro file
 97 * alternatively you can type directly under yo     97 * alternatively you can type directly under your session : root plot.C
 98                                                    98 
 99 The naming scheme on the displayed ROOT plots      99 The naming scheme on the displayed ROOT plots is as follows (see SteppingAction.cc):
100                                                   100 
101 -particles:                                       101 -particles:
102 e-       : 1                                      102 e-       : 1    
103 proton   : 2                                      103 proton   : 2
104 ion    : 3                                        104 ion    : 3
105                                                   105 
106 -processes:                                       106 -processes:
107 e-_G4MicroElecElastic   11                        107 e-_G4MicroElecElastic   11
108 e-_G4MicroElecInelastic   12                      108 e-_G4MicroElecInelastic   12
109 eCapture      13                                  109 eCapture      13
110                                                   110 
111 p_G4MicroElecInelastic    14                      111 p_G4MicroElecInelastic    14
112                                                   112 
113 ion_G4MicroElecInelastic  15                      113 ion_G4MicroElecInelastic  15
114                                                   114 
115 hIoni       16                                    115 hIoni       16
116 eIoni       17                                    116 eIoni       17
117                                                   117 
118 G4MicroElecPhysics parameters:                    118 G4MicroElecPhysics parameters:
119 e-_G4LOPhononScattering         19                119 e-_G4LOPhononScattering         19
120 e-_G4MicroElecSurface           20                120 e-_G4MicroElecSurface           20
121 alpha_G4Dielectrics             21                121 alpha_G4Dielectrics             21
122 ion_G4Dielectrics               22                122 ion_G4Dielectrics               22
123                                                   123 
124                                                   124 
125 ----------------------------------------------    125 ---------------------------------------------------------------------------
126                                                   126 
127 Should you have any enquiry, please do not hes    127 Should you have any enquiry, please do not hesitate to contact one the corresponding authors.