Geant4 Cross Reference |
1 ---------------------------------------------- 1 ------------------------------------------------------------------- 2 ---------------------------------------------- 2 ------------------------------------------------------------------- 3 3 4 ========================================= 4 ========================================================= 5 Geant4 - Microelectronics example 5 Geant4 - Microelectronics example 6 ========================================= 6 ========================================================= 7 7 8 README file 8 README file 9 -------------------- 9 ---------------------- 10 10 11 CORRESPONDING AUTHO << 11 CORRESPONDING AUTHOR 12 12 13 M. Raine*, D. Lambert*, C. Inguimbert', Q. Gib << 13 M. Raine 14 * CEA, DAM, DIF, F-91297 Arpajon, France << 14 CEA, DAM, DIF, F-91297 Arpajon, France 15 ' ONERA, 2 avenue Edouard Belin - BP 74025 - 3 << 15 * e-mail:melanie.raine@cea.fr 16 email: melanie.raine@cea.fr damien.lambert@ce << 17 christophe.Inguimbert@onera.fr Quentin. << 18 16 19 ---->0. INTRODUCTION. 17 ---->0. INTRODUCTION. 20 18 21 The microelectronics example simulates the tra 19 The microelectronics example simulates the track of a 5 MeV proton in silicon. 22 Geant4 standard EM models are used in the Worl 20 Geant4 standard EM models are used in the World volume while Geant4-MicroElec models 23 are used in a Target volume, declared as a Reg 21 are used in a Target volume, declared as a Region. 24 22 25 ---->1. GEOMETRY SET-UP. 23 ---->1. GEOMETRY SET-UP. 26 24 27 By default, the geometry is a 2 um side cube ( << 25 The geometry is a 1 um side cube (World) made of silicon containing a smaller cubic Target volume of silicon. 28 a smaller cubic Target volume of silicon (1 um << 29 The target material can be modified and simula << 30 26 31 ---->2. SET-UP 27 ---->2. SET-UP 32 28 33 Make sure that the G4EMLOW database version is << 29 Make sure G4LEDATA points to the low energy electromagnetic libraries. 34 30 35 The variable G4ANALYSIS_USE must be set to 1. 31 The variable G4ANALYSIS_USE must be set to 1. 36 32 37 The code should be compiled with cmake: 33 The code should be compiled with cmake: >> 34 $ cd $HOME 38 $ mkdir microelectronics-build 35 $ mkdir microelectronics-build 39 $ cd microelectronics-build << 36 $ cd $HOME/microelectronics-build 40 $ cmake -DGeant4_DIR=/your_path/geant4-ins << 37 $ cmake -DGeant4_DIR=/your_path/geant4-install/lib64/Geant4-9.5.0 $HOME/microelectronics 41 $ make 38 $ make 42 39 43 It works in MT mode (but in this example today << 40 It works in MT mode. 44 41 45 ---->3. HOW TO RUN THE EXAMPLE 42 ---->3. HOW TO RUN THE EXAMPLE 46 43 47 In interactive mode, run: 44 In interactive mode, run: 48 45 49 ./microelectronics << 46 ./Microelectronics 50 47 51 The macro microelectronics.mac is executed by 48 The macro microelectronics.mac is executed by default. 52 49 53 To get visualization, make sure to uncomment t 50 To get visualization, make sure to uncomment the #/control/execute vis.mac 54 line in the macro. 51 line in the macro. 55 52 56 By default, the new MicroElec models are used << 57 You can used the Silicon MicroElec models, wi << 58 ./microelectronics -onlySi << 59 or << 60 ./microelectronics microelectronics.mac -onlyS << 61 << 62 You can change the type of the target material << 63 (G4_Ag G4_Al G4_C G4_Cu G4_Ge G4_KAPTON G4_Ni << 64 if you uncomment one line (/microelectronics/d << 65 << 66 << 67 << 68 ---->4. PHYSICS 53 ---->4. PHYSICS 69 54 70 This example shows: 55 This example shows: 71 - how to use the G4MicroElecPhysics and G4Micr << 56 - how to use the Geant4-MicroElec processes, 72 - how to affect them a name 57 - how to affect them a name 73 - how to combine them with Standard EM Physics 58 - how to combine them with Standard EM Physics. 74 59 75 A simple electron capture process is also prov 60 A simple electron capture process is also provided in order to kill electrons 76 below a chosen energy threshold, set in the Ph 61 below a chosen energy threshold, set in the Physics list. 77 62 78 Look at the G4MicroElecSiPhysics.cc (previous << 63 Look at the PhyscisList.cc file. 79 and G4MicroElecPhysics.cc (new MicroElec model << 80 64 81 ---->5. SIMULATION OUTPUT AND RESULT ANALYZIS 65 ---->5. SIMULATION OUTPUT AND RESULT ANALYZIS 82 66 83 The output results consists in a microelectron 67 The output results consists in a microelectronics.root file, containing for each simulation step: 84 - the type of particle for the current step 68 - the type of particle for the current step 85 - the type of process for the current step 69 - the type of process for the current step 86 - the track position of the current step (in n 70 - the track position of the current step (in nanometers) 87 - the energy deposit along the current step (i 71 - the energy deposit along the current step (in eV) 88 - the step length (in nm) 72 - the step length (in nm) 89 - the total enery loss along the current step 73 - the total enery loss along the current step (in eV) 90 74 91 This file can be easily analyzed using for exa 75 This file can be easily analyzed using for example the provided ROOT macro 92 file plot.C; to do so : 76 file plot.C; to do so : 93 * be sure to have ROOT installed on your machi 77 * be sure to have ROOT installed on your machine 94 * be sure to be in the microelectronics direct 78 * be sure to be in the microelectronics directory 95 * launch ROOT by typing root 79 * launch ROOT by typing root 96 * under your ROOT session, type in : .X plot.C 80 * under your ROOT session, type in : .X plot.C to execute the macro file 97 * alternatively you can type directly under yo 81 * alternatively you can type directly under your session : root plot.C 98 82 99 The naming scheme on the displayed ROOT plots 83 The naming scheme on the displayed ROOT plots is as follows (see SteppingAction.cc): 100 84 101 -particles: 85 -particles: 102 e- : 1 86 e- : 1 103 proton : 2 87 proton : 2 104 ion : 3 88 ion : 3 105 89 106 -processes: 90 -processes: 107 e-_G4MicroElecElastic 11 91 e-_G4MicroElecElastic 11 108 e-_G4MicroElecInelastic 12 92 e-_G4MicroElecInelastic 12 109 eCapture 13 93 eCapture 13 110 94 111 p_G4MicroElecInelastic 14 95 p_G4MicroElecInelastic 14 112 96 113 ion_G4MicroElecInelastic 15 97 ion_G4MicroElecInelastic 15 114 98 115 hIoni 16 99 hIoni 16 116 eIoni 17 100 eIoni 17 117 101 118 G4MicroElecPhysics parameters: << 119 e-_G4LOPhononScattering 19 << 120 e-_G4MicroElecSurface 20 << 121 alpha_G4Dielectrics 21 << 122 ion_G4Dielectrics 22 << 123 << 124 << 125 ---------------------------------------------- 102 --------------------------------------------------------------------------- 126 103 127 Should you have any enquiry, please do not hes << 104 Should you have any enquiry, please do not hesitate to contact: >> 105 melanie.raine@cea.fr